Software development | PEGSUS Software Inc. | Japan
Mr. Fumihiko Matsunaga is a distinguished researcher and industry professional with advanced expertise in Plasma simulation, Plasma process modeling, and computational Plasma based dry processing technologies. His work centers on the systematic integration of chemical reaction mechanisms, collision cross sections, and reaction kinetics within Plasma environments to improve the predictive capability and reliability of Plasma simulation frameworks. Through continuous contributions to Plasma focused research and industrial development, he has enabled optimization of complex Plasma processes with significant technological relevance. His scholarly output includes peer reviewed publications that have received international recognition, and his collaborative engagement with applied physics and industrial research teams has strengthened the translation of Plasma science into impactful simulation solutions for society and industry. This professional portfolio is evidenced by a documented research record comprising 3 scholarly citations and 2 formally submitted technical documents.
Profile: ORCID
Featured Publication
1. Takagi, S., Hsiao, S. N., Ma, C. Y., Sekine, M., & Matsunaga, F. (2024). Plasma simulation of HF plasma generated in dual frequency chamber for high aspect ratio dielectric etching. Japanese Journal of Applied Physics.